Introduction: Structure and structuring of solids

  • H. -J. Queisser
Part of the Topics in Applied Physics book series (TAP, volume 22)


Electron Beam Lithography Fiber Optical Waveguide Electromagnetic Wave Field Semiconductor Injection Laser Rotary Anode 
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    A comprehensive collection of articles describing progress in the general field of X-rays is: Advances in X-Ray Analysis, ed. by C.S. Barrett et al. (Plenum Press, New York, each year one volume, representing the Proceedings of the Annual Conference on Applications of X-ray Analysis).Google Scholar
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    The situation up to 1963 is summarized in: X-Ray Optics and X-Ray Microanalysis, ed. by H. H. Pattee, V. E. Cosslett, A. Engström (Academic Press, New York 1963)Google Scholar
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    Modern Difffraction and Imaging Techniques in Material Science, ed. by S. Amelinckx, R. Gevers, G. Remaut, J. van Landuyt (North Holland, Amsterdam 1970)Google Scholar
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    A. N. Broers: “Recent Lithography Trends”, in Proceedings of the Syrnposium on Electron and Ion Beam Technology, 7th Intern. Conf., ed. by R. Bakish (The Electrochemical Society, Princeton 1976)Google Scholar
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    W. Schaaffs: “Erzeugung von Riintgenstrahlen”, in Handbuch der Physik ed. by S. Flügge, Vol. XXX (Springer, Berlin, Heidelberg, New York 1957)Google Scholar
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    M. L. Perlman, E. M. Rowe, R. E. Watson: Phys. Today 27, 30 (1974)Google Scholar
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    M.J. Buerger: Contemporary Crystallography (McGraw-Hill, New York 1970)Google Scholar
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    See, for example, W.Parrish, T.C.Huang: Acta Cryst. A31, 197 (1975)Google Scholar
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    W.A. Wooster: Diffuse X-Ray Reflections from Crystals (Clarendon Press, Oxford 1962)Google Scholar
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    P. Eisenberger, P.M. Platzman, H. Winick: Phys. Rev. Lett. 36, 623 (1976)CrossRefGoogle Scholar
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    L. S. Birks: X-Ray Spectrochemical Analysis (Interscience, New York 1959)Google Scholar
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    See, for example, B. D. Cullity: Elements of X-Ray Diffraction (Addison-Wesley, Reading, Mass. 1976) Chap. 17Google Scholar
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    T. A. Carlson: Photoelectron and Auger Electron Spectroscopy (Plenum Press, New York 1976)Google Scholar
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    In X-Ray Spectroscopy, ed. by L. V. Azároff (McGraw-Hill, New York 1974)Google Scholar
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    V. E. Cosslett, W. C. Nixon: X-Ray Microscopy (Cambridge University Press, London 1960)Google Scholar
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    F.Seward, J. Dent, M. Boyle, L. Koppel, T. Harper, P.Stoering, A.Toor: Rev. Sci. Instr. 47, 464 (1976)CrossRefGoogle Scholar
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    M. B. Panish, I. Hayashi: “Heterostructure Junction Lasers”, in Appl. Solid State Science, ed. by R. Wolfe, Vol. 4 (Academic Press, New York 1974) p.235Google Scholar
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    T.Tamir (ed.): Integrated Optics, Topics in Applied Physics, Vol. 7 (Springer, Berlin, Heidelberg, New York 1975)Google Scholar
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    M. Laue, W. Friedrich, P. Knipping: Ann. Physik 41, 971 (1913)Google Scholar
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    M. v. Laue: Röntgenstrahlinterferenzen, 3rd. ed. (Akademische Verlagsgesellschaft, Frankfurt 1960)Google Scholar
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    G. Borrmann: Z. Physik 42, 157 (1941)Google Scholar
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    A. Y. Cho, J. R. Arthur, Jr.: “Molecular Beam Epitaxy”, in Progress in Solid State Chemistry, ed. by J. McCaldin, G. Somorjai, Vol. 10 (Pergamon Press, New York 1975) pp. 157Google Scholar
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    A. C. Gossard, P. M. Petroff, W. Wiegman, R. Dingle, A. Savage: Appl. Phys. Letters 29, 323 (1976)CrossRefGoogle Scholar
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    G. Chapline, L. Wood: Phys. Today 28, 40 (1975)Google Scholar
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    E. Spiller, R. Feder, J. Topalian, D. Eastman, W. Gudat, D. Sayre: Science 191, 1172 (1976)PubMedGoogle Scholar
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    B. K. Tanner: X-Ray Diffraction Topography (Pergamon Press, New York 1976)Google Scholar
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    A. Yariv and P. Yeh: Opt. Commun. 22, 5 (1977)CrossRefGoogle Scholar

Copyright information

© Springer-Verlag 1977

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  • H. -J. Queisser

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