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Introduction

  • Christopher Michael
  • Mohammed Ismail
Chapter
  • 91 Downloads
Part of the The Kluwer International Series in Engineering and Computer Science book series (SECS, volume 211)

Abstract

Advances in fabrication technology coupled with increasingly demanding circuit specifications have caused a reduction in feature size of metal-oxide semiconductor (MOS) devices in both analog and digital integrated circuits. Associated with the continued reduction in feature size of very large scale integration (VLSI) fabrication processes is an increase in the relative variability of device characteristics. For this reason, statistical techniques are necessary in order to design integrated circuits with maximum yield.

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Copyright information

© Springer Science+Business Media New York 1993

Authors and Affiliations

  • Christopher Michael
    • 1
  • Mohammed Ismail
    • 2
  1. 1.National SemiconductorUSA
  2. 2.Ohio State UniversityUSA

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