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Electrical Properties

  • K. Ellmer
Chapter
Part of the Springer Series in Materials Science book series (SSMATERIALS, volume 104)

Keywords

Carrier Concentration Barrier Height Zinc Oxide Hall Mobility Transparent Conductive Oxide 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. 1.
    A.A. Somerville, Phys. Rev. I 34, 311 1912Google Scholar
  2. 2.
    C. Wagner, W. Schottky, Z. Phys. Chem. B 11, 163 1930Google Scholar
  3. 3.
    K. Hauffe, J. Block, Z. Phys. Chem. 196, 438 1950Google Scholar
  4. 4.
    H.H. von Baumbach, C. Wagner, Z. Phys. Chem. 22, 199 1933Google Scholar
  5. 5.
    E. Mollwo, in Landoldt-Börnstein, NS III 17b, ed. by O. Madelung, M. Schulz, H. Weiss (Springer-Verlag, Berlin, 1982)Google Scholar
  6. 6.
    E. Mollwo, Z. Physik 138, 478 1954ADSGoogle Scholar
  7. 7.
    G. Heiland, E. Mollwo, F. Stöckmann, Solid State Phys. 8, 191 1959Google Scholar
  8. 8.
    W. Meyer, H. Neldel, Z. techn. Phys. 18, 588 1937Google Scholar
  9. 9.
    O. Fritsch, Ann. Phys. 5, 375 1935Google Scholar
  10. 10.
    W. Shockley, Electrons and Holes in Semiconductors, (van Nostrand, Toronto, 1950)Google Scholar
  11. 11.
    E. Scharowsky, Z. Phys. 135, 318 1953ADSGoogle Scholar
  12. 12.
    G. Bogner, E. Mollwo, J. Phys. Chem. Solids 6, 136 1958ADSGoogle Scholar
  13. 13.
    D.G. Thomas, J.J. Lander, J. Chem. Phys. 25, 1136 1956ADSGoogle Scholar
  14. 14.
    R.A. Laudise, E.D. Kolb, A.J. Caporaso, J. Am. Cer. Soc. 47, 9 1964Google Scholar
  15. 15.
    E.E. Hahn, J. Appl. Phys. 22, 855 1951ADSGoogle Scholar
  16. 16.
    S.E. Harrison, Phys. Rev. 93, 52 1954ADSGoogle Scholar
  17. 17.
    A.R. Hutson, Phys. Rev. 108, 222 1957ADSGoogle Scholar
  18. 18.
    D.C. Look, J.W. Hemsky, J.R. Sizelove, Phys. Rev. Lett. 82, 2552 1999ADSGoogle Scholar
  19. 19.
    G.W. Tomlins, J.L. Routbort, T.O. Mason, J. Appl. Phys. 87, 117 2000ADSGoogle Scholar
  20. 20.
    P. Erhart, K. Albe, Phys. Rev. B 73, 115207 2006ADSGoogle Scholar
  21. 21.
    P. Erhart, K. Albe, Appl. Phys. Lett. 88, 201918 2006ADSGoogle Scholar
  22. 22.
    P. Erhart, K. Albe, A. Klein, Phys. Rev. B 73, 205203 2006ADSGoogle Scholar
  23. 23.
    K. Hauffe, C. Seyferth, Reaktionen in und an festen Stoffen, (Springer-Verlag, Berlin, 1966)Google Scholar
  24. 24.
    D.G. Thomas, J. Phys. Chem. Solids 9, 31 1958ADSGoogle Scholar
  25. 25.
    F.A. Kröger, The Chemistry of Imperfect Crystals. Imperfection Chemistry of Crystalline Solids, vol. 2, 2nd edn. (North-Holland, Amsterdam, 1973)Google Scholar
  26. 26.
    T. Minami, MRS Bull. 25(Aug), 38 2000Google Scholar
  27. 27.
    N. Roberts, R.P. Wang, A.W. Sleight, W.W. Warren, Phys. Rev. B 57, 5734 1998ADSGoogle Scholar
  28. 28.
    D.G. Thomas, J.J. Lander, in Halbleiter und Phosphore, ed. by M. Schön, H. Welker (Vieweg, Braunschweig, 1958), p. 534Google Scholar
  29. 29.
    C.G. van de Walle, Phys. Rev. Lett. 85, 1012 2000ADSGoogle Scholar
  30. 30.
    D.M. Hofmann, A. Hofstaetter, F. Leiter, H. Zhou, F. Henecker, B.K. Meyer, S.O. Orlinskij, J. Schmidt, P.G. Baranov, Phys. Rev. Lett. 88, 045504 2002ADSGoogle Scholar
  31. 31.
    P.W. Peacock, J. Robertson, Appl. Phys. Lett. 83, 2025 2003ADSGoogle Scholar
  32. 32.
    J. Robertson, K. Xiong, S.J. Clark, Thin Solid Films 496, 1 2006ADSGoogle Scholar
  33. 33.
    N. Nickel, in Zinc Oxide - A Material for Micro- and Optoelectronic Applications, d. by N. Nickel, E. Terukov (Springer, Dordrecht, 2005), pp. 145-155Google Scholar
  34. 34.
    A.R. Hutson, J. Phys. Chem. Solids 8, 467 1959ADSGoogle Scholar
  35. 35.
    P. Wagner, R. Helbig, J. Phys. Chem. Solids 35, 327 1974ADSGoogle Scholar
  36. 36.
    K.I. Hagemark, L.C. Chacka, J. Solid State Chem. 15, 261 1975ADSGoogle Scholar
  37. 37.
    D.C. Look, D.C. Reynolds, J.R. Sizelove, R.L. Jones, C.W. Litton, G. Cantwell, W.C. Harsch, Solid State Commun. 105, 399 1998ADSGoogle Scholar
  38. 38.
    H. von Wenckstern, S. Weinhold, G. Biehne, R. Pickenhain, H. Schmidt, H. Hochmuth, M. Grundmann, Adv. Solid State Phys. 45, 263 2005Google Scholar
  39. 39.
    B.K. Meyer, J. Sann, D.M. Hofmann, C. Neumann, A. Zeuner, Semicond. Sci. Technol. 20, S62 2005ADSGoogle Scholar
  40. 40.
    J.J. Lander, J. Phys. Chem. Solids 15, 324 1960ADSGoogle Scholar
  41. 41.
    O.F. Schirmer, J. Phys. Chem. Solids 29, 1407 1968ADSGoogle Scholar
  42. 42.
    A.R. Hutson, Phys. Rev. Lett. 4, 505 1960ADSGoogle Scholar
  43. 43.
    R. Wang, J.H. Xin, Y. Yang, H. Liu, L. Xu, J. Hu, Appl. Surf. Sci. 227, 312 2004ADSGoogle Scholar
  44. 44.
    Y. Yan, S.B. Zhang, S.T. Pantelides, Phys. Rev. Lett. 86, 5723 2001ADSGoogle Scholar
  45. 45.
    P. Fons, H. Tampo, A.V. Kolobov, M. Ohkubo, S. Niki, J. Tominaga, R. Carboni, F. Boscherini, S. Friedrich, Phys. Rev. Lett. 96, 045504 2006ADSGoogle Scholar
  46. 46.
    B.K. Meyer, H. Alves, D.M. Hofmann, W. Kriegseis, D. Forster, F. Bertram, J. Christen, A. Hoffmann, M. Straßburg, M. Dworzak, U. Haboeck, A.V. Rodina, Phys. Stat. Sol. (b) 241, 231 2004ADSGoogle Scholar
  47. 47.
    J. Fan, R. Freer, J. Appl. Phys. 77, 4795 1995ADSGoogle Scholar
  48. 48.
    A.N. Gruzintsev, V.T. Volkov, E.E. Yakimov, Semicond. 37, 259 2003ADSGoogle Scholar
  49. 49.
    R.E. Dietz, H. Kamimura, M.D. Sturge, A. Yariv, Phys. Rev. 132, 1559 1963ADSGoogle Scholar
  50. 50.
    D. Zwingel, J. Lumin. 5, 385 1972Google Scholar
  51. 51.
    D. Pfisterer, J. Sann, D.M. Hofmann, M. Plana, A. Neumann, M. Lerch, B.K. Meyer, Phys. Stat. Sol. (a) 243, R1 2005ADSGoogle Scholar
  52. 52.
    B. Claflin, D.C. Look, S.J. Park, G. Cantwell, J. Cryst. Growth 287, 16 2006ADSGoogle Scholar
  53. 53.
    P.W. Li, K.I. Hagemark, J. Solid State Chem. 12, 371 1975ADSGoogle Scholar
  54. 54.
    D.L. Rode, in Semiconductors and Semimetals, ed. by R.K. Willardson, A.C. Beer (Academic, New York, 1975), pp. 1-89Google Scholar
  55. 55.
    S.S. Devlin, in Physics and Chemistry of II-VI Compounds, ed. by M. Aven, J.S. Prener (North-Holland, Amsterdam, 1967), pp. 549-609Google Scholar
  56. 56.
    J. Bardeen, W. Shockley, Phys. Rev. 80, 72 1950zbMATHMathSciNetADSGoogle Scholar
  57. 57.
    K. Seeger, Semiconductor Physics (Springer-Verlag, Berlin, 1991)Google Scholar
  58. 58.
    C. Solbrig, Z. Phys. 211, 429 1968ADSGoogle Scholar
  59. 59.
    A. Ballato, IEEE Ultrasonics Symp., 575 (1996)Google Scholar
  60. 60.
    J.D. Zook, Phys. Rev. 136, A869 1964ADSGoogle Scholar
  61. 61.
    K.W. Böer, Survey of Semiconductor Physics. Electrons and Other Particles in Bulk Semiconductors (Van Nostrand Reinhold, New York, 1990)Google Scholar
  62. 62.
    C. Klingshirn, H. Priller, M. Decker, J. Brückner, H. Kalt, R. Hauschild, J. Zeller, A. Waag, A. Bakin, H. Wehmann, K. Thonke, R. Sauer, R. Kling, F. Reuss, C. Kirchner, Adv. Solid State Phys. 45, 275 2005Google Scholar
  63. 63.
    A. Mang, K. Reimann, S. Rübenacke, Solid State Commun. 94, 251 1995ADSGoogle Scholar
  64. 64.
    T. Makino, Y. Segawa, A. Tsukazaki, A. Ohtomo, M. Kawasaki, Appl. Phys. Lett. 87, 022101 2005Google Scholar
  65. 65.
    N. Ashkenov, B.N. Mbenkum, C. Bundesmann, V. Riede, M. Lorenz, D. Spemann, E.M. Kaidashev, A. Kasic, M. Schubert, M. Grundmann, G. Wagner, H. Neumann, V. Darakchieva, H. Arwin, B. Monemar, J. Appl. Phys. 93, 126 2003ADSGoogle Scholar
  66. 66.
    U. Ö zgür, Y.I. Alivov, C. Liu, A. Teke, M.A. Reshchikov, S. Dogan, V. Avrutin, S.J. Cho, H. Morkoc, J. Appl. Phys. 98, 041301 2005ADSGoogle Scholar
  67. 67.
    K. Ellmer, J. Phys. D: Appl. Phys. 34, 3097 2001ADSGoogle Scholar
  68. 68.
    J.D. Albrecht, P.P. Ruden, S. Limpijumnong, W.R.L. Lambrecht, K.F. Brennan, J. Appl. Phys. 86, 6864 1999ADSGoogle Scholar
  69. 69.
    T. Minami, H. Sato, K. Ohashi, T. Tomofuji, S. Takata, J. Cryst. Growth 117,370 1992ADSGoogle Scholar
  70. 70.
    T.B. Bateman, J. Appl. Phys. 33, 3309 1962ADSGoogle Scholar
  71. 71.
    G. Carlotti, D. Fioretto, G. Socino, E. Verona, J. Phys.: Condens. Mat. 7, 9147 1995ADSGoogle Scholar
  72. 72.
    T. Azuhata, M. Takesata, T. Yagi, A. Shikanai, S.F. Chichibu, K. Torii, A. Nakamura, T. Sota, G. Cantwell, D.B. Eason, C.W. Litton, J. Appl. Phys. 94,968 2003ADSGoogle Scholar
  73. 73.
    I.B. Kobiakov, Solid State Commun. 35, 305 1980ADSGoogle Scholar
  74. 74.
    E. Conwell, V.F. Weisskopf, Phys. Rev. 77, 388 1950zbMATHADSGoogle Scholar
  75. 75.
    E. Conwell, V.F. Weisskopf, Phys. Rev. 69, 258 1946Google Scholar
  76. 76.
    H. Brooks, Adv. Electron. Electron Phys. 7, 85 1955Google Scholar
  77. 77.
    H. Brooks, Phys. Rev. 83, 879 1951Google Scholar
  78. 78.
    V.I. Fistul, Heavily Doped Semiconductors (Plenum, New York, 1969)Google Scholar
  79. 79.
    D. Chattopadhyay, H.J. Queisser, Rev. Mod. Phys. 53, 745 1981ADSGoogle Scholar
  80. 80.
    R.B. Dingle, Phil. Mag. 46, 831 1955zbMATHGoogle Scholar
  81. 81.
    W. Zawadzki, in Handbook on Semiconductors, ed. by T.S. Moss (North-Holland, Amsterdam, 1982), pp. 713-803Google Scholar
  82. 82.
    R.T. Bate, R.D. Baxter, F.J. Reid, A.C. Beer, J. Phys. Chem. Solids 26, 1205 1965ADSGoogle Scholar
  83. 83.
    T. Pisarkiewicz, K. Zakrzewska, E. Leja, Thin Solid Films 174, 217 1989ADSGoogle Scholar
  84. 84.
    S. Brehme, F. Fenske, W. Fuhs, E. Neubauer, M. Poschenrieder, B. Selle, I. Sieber, Thin Solid Films 342, 167 1999ADSGoogle Scholar
  85. 85.
    N.G. Nilsson, Phys. Stat. Sol. (a) 19, K75 1973ADSGoogle Scholar
  86. 86.
    J.S. Blakemore, Solid-State Electr. 25, 1067 1982ADSGoogle Scholar
  87. 87.
    D. Mergel, Z. Qiao, J. Appl. Phys. 95, 5608 2004ADSGoogle Scholar
  88. 88.
    H.L. Hartnagel, A.L. Dawar, A.K. Jain, C. Jagadish, Semiconducting Transparent Thin Films (Institute of Physics Publishing, Bristol, 1995)Google Scholar
  89. 89.
    C. Erginsoy, Phys. Rev. 79, 1013 1950ADSGoogle Scholar
  90. 90.
    K.M. Itoh, W. Walukiewicz, H.D. Fuchs, J.W. Beeman, E.E. Haller, J.W. Farmer, V.I. Ozhogin, Phys. Rev. B 50, 16995 1994ADSGoogle Scholar
  91. 91.
    G.B. Stringfellow, H.T. Hall, R.A. Burmeister, J. Appl. Phys. 46, 3006 1975ADSGoogle Scholar
  92. 92.
    E.F. Venger, A.V. Melnichuk, L.Y. Melnichuk, Y.A. Pasechnik, Phys. Stat. Sol. (b) 188, 823 1995ADSGoogle Scholar
  93. 93.
    J. Nause, B. Nemeth, Semicond. Sci. Technol. 20, S45 2005ADSGoogle Scholar
  94. 94.
    H. Rupprecht, J. Phys. Chem. Solids 6, 144 1958ADSGoogle Scholar
  95. 95.
    W.S. Baer, Phys. Rev. 154, 785 1967ADSGoogle Scholar
  96. 96.
    A. Hausmann, W. Teuerle, Z. Phys. 259, 189 1973ADSGoogle Scholar
  97. 97.
    B. Utsch, A. Hausmann, Z. Phys. B 21, 27 1975Google Scholar
  98. 98.
    F.P. Koffyberg, Can. J. Phys. 49, 435 1971ADSGoogle Scholar
  99. 99.
    H. Finkenrath, H. Köhler, M. Lochmann, Z. Angew. Phys. 21, 512 1966Google Scholar
  100. 100.
    R.L. Weiher, J. Appl. Phys. 33, 2834 1962ADSGoogle Scholar
  101. 101.
    Z.M. Jarzebski, J.P. Marton, J. Electrochem. Soc. 123, 299C 1976Google Scholar
  102. 102.
    J.C. Bean, In High-Speed Semiconductor Devices, ed. by S.M. Sze (Wiley, New York, 1990), pp. 13-55Google Scholar
  103. 103.
    G. Masetti, M. Severi, S. Solmi, IEEE Trans. Electron Dev. ED30, 764 1983Google Scholar
  104. 104.
    D.B.M. Klaassen, Solid-State Electr. 35, 953 1992ADSGoogle Scholar
  105. 105.
    P. Fons, K. Iwata, A. Yamada, K. Matsubara, S. Niki, K. Nakahara, T. Tanabe, H. Takasu, Appl. Phys. Lett. 77, 1801 2000ADSGoogle Scholar
  106. 106.
    K. Ellmer, G. Vollweiler, Thin Solid Films 496, 104 2006ADSGoogle Scholar
  107. 107.
    M. Matsuoka, Jpn. J. Appl. Phys. 10, 736 1971ADSGoogle Scholar
  108. 108.
    G.D. Mahan, J. Appl. Phys. 54, 3825 1983ADSGoogle Scholar
  109. 109.
    L.M. Levinson, H.R. Philipp, Ceram. Bull. 65, 639 1986Google Scholar
  110. 110.
    T.K. Gupta, J. Am. Cer. Soc. 73, 1817 1990Google Scholar
  111. 111.
    D.R. Clarke, J. Appl. Phys. 50, 6829 1979ADSGoogle Scholar
  112. 112.
    F. Greuter, G. Blatter, Semicond. Sci. Technol. 5, 111 1990ADSGoogle Scholar
  113. 113.
    P.R. Emtage, J. Appl. Phys. 48, 4372 1977ADSGoogle Scholar
  114. 114.
    L.M. Levinson, H.R. Philipp, J. Appl. Phys. 46, 1332 1975ADSGoogle Scholar
  115. 115.
    J.G. Simmons, J. Appl. Phys. 34, 1793 1963ADSGoogle Scholar
  116. 116.
    H.R. Philipp, L.M. Levinson, J. Appl. Phys. 48, 1621 1977ADSGoogle Scholar
  117. 117.
    F.S. Hickernell, J. Appl. Phys. 44, 1061 1973ADSGoogle Scholar
  118. 118.
    N.F. Foster, G.A. Rozgonyi, Appl. Phys. Lett. 8, 221 1966ADSGoogle Scholar
  119. 119.
    N.F. Foster, J. Vac. Sci. Technol. 6, 111 1969ADSGoogle Scholar
  120. 120.
    J.B. Webb, D.F. Williams, M. Buchanan, Appl. Phys. Lett. 39, 640 1981ADSGoogle Scholar
  121. 121.
    G.L. Harding, B. Window, E.C. Horrigan, Sol. Energy Mater. 22, 69 1991Google Scholar
  122. 122.
    J. Hu, R.G. Gordon, Solar Cells 30, 437 1991Google Scholar
  123. 123.
    K. Saito, Y. Watanabe, K. Takahashi, T. Matsuzawa, B. Sang, M. Konagai, Sol. Energy Mat. Sol. Cells 49, 187 1997Google Scholar
  124. 124.
    A. Suzuki, T. Matsushita, N. Wada, Y. Sakamoto, M. Okuda, Jpn. J. Appl. Phys. 35, L56 1996ADSGoogle Scholar
  125. 125.
    E.M. Kaidashev, M. Lorenz, H. vonWenckstern, A. Rahm, H.C. Semmelhack, K.H. Han, G. Benndorf, C. Bundesmann, H. Hochmuth, M. Grundmann, Appl. Phys. Lett. 82, 3901 2003ADSGoogle Scholar
  126. 126.
    J.H. Morgan, D.E. Brodie, Can. J. Phys. 60, 1387 1982ADSGoogle Scholar
  127. 127.
    J. Ma, F. Ji, D. Zhang, H. Ma, S. Li, Thin Solid Films 357, 98 1999Google Scholar
  128. 128.
    S. Major, A. Banerjee, K.L. Chopra, Thin Solid Films 108, 333 1983ADSGoogle Scholar
  129. 129.
    D.R. Acosta, O. Lovera, A. Maldonado, R. Asomoza, H. Gomez, A. Palafox, M. d. l. Olvera, J. Palacios-Gomez, Mater. Res. Soc. Symp. Proc. 355, 587 1994Google Scholar
  130. 130.
    T. Okamura, Y. Seki, S. Nakagari, H. Okushi, Jpn. J. Appl. Phys. 31, 3218 1992ADSGoogle Scholar
  131. 131.
    T. Nagase, T. Ooie, J. Sakakibara, Thin Solid Films 357, 151 1999ADSGoogle Scholar
  132. 132.
    T. Yoshida, M. Iwaya, H. Ando, T. Oekermann, K. Nonomura, D. Schlettwein, D. Wöhrle, H. Minoura, Chem. Commun., 400-401 (2004)Google Scholar
  133. 133.
    I. Sieber, N. Wanderka, I. Urban, I. Dörfel, E. Schierhorn, F. Fenske, W. Fuhs, Thin Solid Films 330, 108 1998ADSGoogle Scholar
  134. 134.
    L. Sagalowicz, G.R. Fox, J. Mater. Res. 14, 1876 1999ADSGoogle Scholar
  135. 135.
    B. Pödör, Phys. Stat. Sol. 16, K167 1966ADSGoogle Scholar
  136. 136.
    D.C. Look, J.R. Sizelove, Phys. Rev. Lett. 82, 1237 1999ADSGoogle Scholar
  137. 137.
    D. Cherns, C.G. Jiao, Phys. Rev. Lett. 87, 205504 2001Google Scholar
  138. 138.
    E. Müller, D. Litvinov, D. Gerthsen, C. Kirchner, A. Waag, N. Oleynik, A. Dadgar, A. Krost, in Zinc Oxide - A Material for Micro- and Optoelectronic Applications, ed. by N. Nickel, E. Terukov (Springer, Dordrecht, 2005), pp. 99-111Google Scholar
  139. 139.
    D. Gerthsen, D. Litvinov, T. Gruber, C. Kirchner, A. Waag, Appl. Phys. Lett. 81,3972 2002ADSGoogle Scholar
  140. 140.
    C. Coskun, D.C. Look, G.C. Farlow, J.R. Sizelove, Semicond. Sci. Technol. 19,752 2004ADSGoogle Scholar
  141. 141.
    J.J. Harris, K.J. Lee, J.B. Webb, H. Tang, I. Harrison, L.B. Flannery, T.S. Cheng, C.T. Foxon, Semicond. Sci. Technol. 15, 413 2000ADSGoogle Scholar
  142. 142.
    J.Y. Seto, J. Appl. Phys. 46, 5247 1975ADSGoogle Scholar
  143. 143.
    G. Baccarani, B. Ricco, G. Spadini, J. Appl. Phys. 49, 5565 1978ADSGoogle Scholar
  144. 144.
    S.M. Sze, Physics of Semiconductor Devices (John Wiley & Sons, New York, 1981)Google Scholar
  145. 145.
    J. Orton, M. Powell, Rep. Prog. Phys. 43, 1263 1980ADSGoogle Scholar
  146. 146.
    J. Oertel, K. Ellmer, W. Bohne, J. Röhrich, H. Tributsch, J. Cryst. Growth 198/199, 1205 1999ADSGoogle Scholar
  147. 147.
    J. Werner, in Polycrystalline Semiconductors III-Physics and Technology, ed. by H. Strunk, J. Werner, B. Fortin, O. Bonaud (Scitec Publ., Switzerland, Zug, Switzerland, 1993), p. 534Google Scholar
  148. 148.
    R. Lipperheide, T. Weis, U. Wille, Sol. Energy Mat. Sol. Cells 65, 157 2001Google Scholar
  149. 149.
    R. Lipperheide, T. Weis, U. Wille, J. Phys.: Condens. Mater. 13, 3347 2001ADSGoogle Scholar
  150. 150.
    R. Lipperheide, U. Wille, Phys. Rev. B 68, 115315 2003ADSGoogle Scholar
  151. 151.
    T. Weis, S. Brehme, P. Kanschat, W. Fuhs, R. Lipperheide, U. Wille, J. Non-Cryst. Solids 299-302, 380 2002ADSGoogle Scholar
  152. 152.
    T. Weis, R. Lipperheide, U. Wille, S. Brehme, J. Appl. Phys. 92, 1411 2002ADSGoogle Scholar
  153. 153.
    T. Kamins, Polycrystalline Silicon for Integrated Circuit Applications (Kluwer, Boston, 1988)Google Scholar
  154. 154.
    C.G. Granqvist, A. Hultåker, Thin Solid Films 411, 1 (2002)ADSGoogle Scholar
  155. 155.
    K. Blankenbach, in Adv. Solid State Phys., vol. 40, ed. by B. Kramer (Vieweg, Braunschweig, 2000), pp. 657-668Google Scholar
  156. 156.
    J. Hu, R.G. Gordon, J. Electrochem. Soc. 139, 2014 1992ADSGoogle Scholar
  157. 157.
    K. Ellmer, J. Phys. D: Appl. Phys. 33, R17 2000Google Scholar
  158. 158.
    J.R. Bellingham, W.A. Phillips, C.J. Adkins, J. Mater. Sci. Lett. 11, 263 1992Google Scholar
  159. 159.
    R. Wang, L.L.H. King, A.W. Sleight, J. Mater. Res. 11, 1659 1996ADSGoogle Scholar
  160. 160.
    J. Bruneaux, H. Cachet, M. Froment, A. Messad, Electrochim. Acta 39, 1251 1993Google Scholar
  161. 161.
    D.B.M. Klaassen, Solid-State Electr. 35, 961 1992ADSGoogle Scholar
  162. 162.
    P. Ebert, Z. Zhang, F. Kluge, M. Simon, Z. Zhang, K. Urban, Phys. Rev. Lett. 83,757 1999ADSGoogle Scholar
  163. 163.
    M. Kon, P.K. Song, Y. Shigesato, P. Frach, S. Ohno, K. Suzuki, Jpn. J. Appl. Phys. 42, 263 2003ADSGoogle Scholar
  164. 164.
    H. Agura, A. Suzuki, T. Matsushita, T. Aoki, M. Okudaa, Thin Solid Films 445,263 2003ADSGoogle Scholar
  165. 165.
    M. Lorenz, E.M. Kaidashev, H. vonWenckstern, V. Riede, C. Bundesmann, D. Spemann, G. Benndorf, H. Hochmuth, A. Rahm, H.C. Semmelhack, M. Grundmann, Solid-State Electr. 47, 2205 2003ADSGoogle Scholar
  166. 166.
    M. Kon, P.K. Song, Y. Shigesato, P. Frach, A. Mizukami, K. Suzuki, Jpn. J. Appl. Phys. 41, 814 2002ADSGoogle Scholar
  167. 167.
    T. Minami, S. Suzuki, T. Miyata, Mater. Res. Soc. Symp. Proc. 666, F1.3.1 (2001)Google Scholar
  168. 168.
    C. Agashe, O. Kluth, J. Hüpkes, U. Zastrow, B. Rech, M. Wuttig, J. Appl. Phys. 95, 1911 2004ADSGoogle Scholar
  169. 169.
    H. Nanto, T. Minami, S. Shooji, S. Takata, J. Appl. Phys. 55, 1029 1984ADSGoogle Scholar
  170. 170.
    K.S. Weißenrieder, J. Müller, Thin Solid Films 300, 30 1997ADSGoogle Scholar
  171. 171.
    F.R. Blom, F.C.M. van de Pol, G. Bauhuis, T.J.A. Popma, Thin Solid Films 204,365 1991ADSGoogle Scholar
  172. 172.
    P.F. Carcia, R.S. McLean, M.H. Reilly, G. Nunes, Appl. Phys. Lett. 82, 1117 2003ADSGoogle Scholar
  173. 173.
    K. Ellmer, R. Mientus, Thin Solid Films Available online since June 14th (2007), DOI: 10.1016/j.tsf2007.05.084, will be published in 2007.Google Scholar
  174. 174.
    J. Szczyrbowski, K. Schmalzbauer, H. Hoffmann, Thin Solid Films 137, 169 1986ADSGoogle Scholar
  175. 175.
    A. Messad, J. Bruneaux, H. Cachet, M. Froment, J. Mater. Sci. 29, 5095 1994ADSGoogle Scholar
  176. 176.
    H. Witte, A. Krtschil, E. Schrenk, K. Fluegge, A. Dadgar, A. Krost, J. Appl. Phys. 97, 043710 2005ADSGoogle Scholar
  177. 177.
    V. Kazukauskas, G. Kühnel, W. Siegel, Appl. Phys. Lett. 70, 1751 1997ADSGoogle Scholar
  178. 178.
    F.M. Hossain, J. Nishi, S. Takagi, A. Ohtomo, T. Fukumura, H. Fuijioka, H. Ohno, H. Koinuma, M. Kawasaki, J. Appl. Phys. 94, 7768 2003ADSGoogle Scholar
  179. 179.
    R. Dingle, H.L. Störmer, A.C. Gossard, W. Wiegmann, Appl. Phys. Lett. 33, 665 1978ADSGoogle Scholar
  180. 180.
    J.J. Harris, J.A. Pals, R. Woltjer, Rep. Prog. Phys. 52, 1217 1989ADSGoogle Scholar
  181. 181.
    I.A. Rauf, Mater. Lett. 18, 123 1993Google Scholar
  182. 182.
    A.A. Grinberg, S. Luryi, J. Appl. Phys. 61, 1181 1987ADSGoogle Scholar
  183. 183.
    D.J. Cohen, S.A. Barnett, J. Appl. Phys. 98, 053705 2005ADSGoogle Scholar
  184. 184.
    T. Glatzel, D. FuertesMarron, T. Schedel-Niedrig, S. Sadewasser, M.C. Lux-Steiner, Appl. Phys. Lett. 81, 2017 2002ADSGoogle Scholar
  185. 185.
    A. Ohtomo, M. Kawasaki, T. Koida, K. Masubuchi, H. Koinuma, Y. Sakurai, Y. Yoshida, T. Yasuda, Y. Segawa, Appl. Phys. Lett. 72, 2466 1998ADSGoogle Scholar
  186. 186.
    G.V. Rao, F. Säuberlich, A. Klein, Appl. Phys. Lett. 87, 032101 2005ADSGoogle Scholar
  187. 187.
    J.J. Cuomo, R.J. Gambino, J.M.E. Harper, J.D. Kuptsis, J.C. Webber, J. Vac. Sci. Technol. 15, 281 1978ADSGoogle Scholar
  188. 188.
    R. Könenkamp, Photoelectric Properties and Applications of Low-Mobility Semiconductors (Springer, Berlin Heidelberg Newyork, 2000)Google Scholar
  189. 189.
    G. Thomas, Nature 389, 907 1997ADSGoogle Scholar
  190. 190.
    H. Ohta, K. Nomura, H. Hiramatsu, K. Ueda, T. Kamiya, M. Hirano, H. Hosono, Solid-State Electr. 47, 2261 2003ADSGoogle Scholar
  191. 191.
    E.M.C. Fortunato, P.M.C. Barquinha, A.C.M.B. Pimentel, A.M.F. Goncalves, A.J.S. Marques, L.M.N. Pereira, R.F.P. Martins, Adv. Mater. 17, 590 2005Google Scholar
  192. 192.
    E.M.C. Fortunato, P.M.C. Barquinha, A.C.M.B.G. Pimentel, A.M.F. Goncalves, A.J.S. Marques, R.F.P. Martins, L.M.N. Pereira, Appl. Phys. Lett. 85,2541 2004ADSGoogle Scholar
  193. 193.
    J. Fan, R. Freer, J. Am. Cer. Soc. 77, 2263 1994Google Scholar
  194. 194.
    B.K. Meyer, J. Sann, A. Zeuner, Adv. Solid State Phys. 45, 289 2005Google Scholar
  195. 195.
    D.C. Look, Semicond. Sci. Technol. 20, S55 2005ADSGoogle Scholar
  196. 196.
    E.C. Lee, Y.S. Kim, Y.G. Jin, K.J. Chang, Phys. Rev. B 64, 085120 2001ADSGoogle Scholar

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  • K. Ellmer

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