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Magnetron Sputtering of ZnO Films

  • B. Szyszka
Chapter
Part of the Springer Series in Materials Science book series (SSMATERIALS, volume 104)

Glow discharge sputtering is one of the oldest deposition techniques that utilizes an energy input to promote surface diffusion at the substrate and thus, to achieve dense and well-adhering coatings at low substrate temperatures. The term “sputtering” means the ejection of atoms from a usually solid target material due to the impact of highly energetic species. These highly energetic species are usually positive ions, which can either be accelerated in the cathode sheath of a plasma discharge or in an ion source.

Keywords

Substrate Temperature Thin Solid Film Oxygen Partial Pressure Magnetron Sputtering Discharge Power 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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© Springer 2008

Authors and Affiliations

  • B. Szyszka
    • 1
  1. 1.Fraunhofer Institute for Surface Engineering and Thin Films (IST)BraunschweigGermany

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