High Resolution Microfabrication and Neural Networks
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This paper reviews basic lithographic considerations for current integrated circuit fabrication at the 1 micron level and illustrates methods for making structures with dimensions smaller than 0.1 micron. Many of these methods are well suited to fabricating high-density, resistive neural-networks.
KeywordsProximity Effect Projection Optic Micron Level Minimum Feature Size Wire Pair
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