Laser-Induced Deposition

  • Ian W. Boyd
Part of the Springer Series in Materials Science book series (SSMATERIALS, volume 3)


In this chapter film growth from the gas phase is described. Two main reaction modes are possible, namely, laser pyrolysis and laser photolysis. The former is closely related to traditional chemical vapour deposition, but with use of lasers significantly enhanced reaction rates can be achieved. Laser photolysis utilises selective photochemical bond-breaking, so that much reduced processing temperatures can be employed. Oxide and nitride deposition from various precursor mixtures, as well as organic polymer formation, are reviewed.


Chemical Vapour Deposition Silicon Nitride Chemical Vapour Deposition Reaction Thermal Chemical Vapour Deposition Laser Pyrolysis 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


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Recommendation for Further Reading

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Copyright information

© Springer-Verlag Berlin Heidelberg 1987

Authors and Affiliations

  • Ian W. Boyd
    • 1
  1. 1.Department of Electronic and Electrical EngineeringUniversity College LondonLondonUK

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